Our high-performance specially formulated STI CMP colloidal ceria products are designed for low point of use solids.  

Truplane® 2303
Truplane® 2303 cerium oxide slurries are designed for 14nm and below. These products combine optimized particle science with novel accelerants to provide a fast removal rate with the lowest solids content allowing a lower downforce resulting in low defectivity with lower cost of ownership.

 
• Tightly controlled particle size distributions and low LPCs ensure polishing consistency and low defectivity
• A wide portfolio of colloidal ceria-based offerings designed to deliver ultra-low scratch performance
• Tailored particle surface chemistry, combined with proprietary chemical packages, allows for precise control of selectivity and oxide removal rates.
• Wide over-polishing windows due to extremely low dishing and low nitride loss
• Low point of use solids for reduced cost of ownership